FABRICATING MASTER WITH REACTIVE ION-BEAM ETCHING METHOD

The fabrication process of glass master or glass etching optical disk using reactive ion beam (RIB) etching method was studied. Photoresist was applied for image reversal. RIB etching using CF4 gas transferred the pregrooves into the glass substrate. The shape and depth of the pr egrooves in the glass is a function of the RIB etcher settings. A glas s substrate of phi 130mm with etched pregrooves (track pitch was 1.6 m u m and groove depth 0.1 mu m) was obtained, showing that a glass mast er or glass etching disc can be fabricated by this technique.