STABILITY OF MO SI MULTILAYER STRUCTURE USED IN BRAGG-FRESNEL OPTICS/

Authors
LE ZC CAO JL LIANG JQ PEI S YAO JS CUI CJ
Citation
Zc. Le et al., STABILITY OF MO SI MULTILAYER STRUCTURE USED IN BRAGG-FRESNEL OPTICS/, Chinese Physics Letters, 15(7), 1998, pp. 522-524
Citations number
6
Categorie Soggetti
Physics
Journal title
Chinese Physics Letters → ACNP
ISSN journal
0256307X
Volume
15
Issue
7
Year of publication
1998
Pages
522 - 524
Database
ISI
SICI code
0256-307X(1998)15:7<522:SOMSMS>2.0.ZU;2-G
Abstract
The thermal and chemical stabilities of Mo/Si multilayer structure use d in Bragg-Fresnel optics were studied to get optimal technological pa rameters of pattern generation. Mo/Si multilayers were annealed at tem perature ranging from 360 to 770 K, treated with acetone and 5 parts p er thousand NaOH solution, and characterized by small-angle x-ray diff raction technique as well as x-ray photoelectron spectroscopy, and Oly mpus microscopy.