In0.87Ga0.13As/InAs0.70P0.30 double heterostructure light emitting dio
des were grown on InP substrates using strain relaxed buffers by molec
ular beam epitaxy. The InAsP buffer incorporates a compositional step-
back to reduce the threading dislocation density in the active region.
Efficient electroluminescence at 2.7 mu m was obtained at room temper
ature. A strong absorption is observed in the emission spectrum due to
the presence of water vapour.