CORRELATION BETWEEN IN-SITU OPTICAL-EMISSION SPECTROSCOPY IN A REACTIVE AR O-2 RF MAGNETRON SPUTTERING DISCHARGE AND PB(ZRXTI1-X)O-3 THIN-FILM COMPOSITION/

Authors
AYGUAVIVES F EAKIM B AUBERT P AGIUS B BRETAGNE J
Citation
F. Ayguavives et al., CORRELATION BETWEEN IN-SITU OPTICAL-EMISSION SPECTROSCOPY IN A REACTIVE AR O-2 RF MAGNETRON SPUTTERING DISCHARGE AND PB(ZRXTI1-X)O-3 THIN-FILM COMPOSITION/, Applied physics letters, 73(8), 1998, pp. 1023-1025
Citations number
16
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
73
Issue
8
Year of publication
1998
Pages
1023 - 1025
Database
ISI
SICI code
0003-6951(1998)73:8<1023:CBIOSI>2.0.ZU;2-#
Abstract
Lead zirconate titanate Pb(ZrxTi(1-x))O-3 (PZT) thin films have been d eposited by rf magnetron sputtering on Si substrates from a metallic t arget of nominal composition Pb-1.1(Zr0.4Ti0.6) in a reactive argon/ox ygen gas mixture. During plasma deposition, in situ optical emission s pectroscopy measurements show clearly a correlation between the evolut ion of characteristic atomic emission line intensities Zr-386.4 nm, Ti -399.9 nm, Pb-405.8 nm, and O-777.2 nm and the thin-film composition d etermined by a simultaneous use of Rutherford backscattering spectrosc opy and nuclear reaction analysis. (C) 1998 American Institute of Phys ics. [S0003-6951(98)01734-3].