V. Magidson et al., EVIDENCE OF SI PRESENCE IN SELF-ASSEMBLED GE ISLANDS DEPOSITED ON A SI(001) SUBSTRATE, Applied physics letters, 73(8), 1998, pp. 1044-1046
Nominal Ge islands were grown by a molecular beam epitaxy technique on
a Si(001) substrate. Island positions and shapes were measured by ato
mic force microscopy. Two types of islands with different sizes and sh
apes are present. The Si concentration distribution inside the islands
was measured by Raman imaging technique with a 0.4 mu m resolution, a
nd was found to vary between 10% and 30% in large islands and be 10% i
n smaller islands. (C) 1998 American Institute of Physics. [S0003-6951
(98)04734-2].