STRESS-RELATED INTERDIFFUSION IN DC SPUTTERED TIN B-C-N MULTILAYERS/

Citation
S. Fayeulle et M. Nastasi, STRESS-RELATED INTERDIFFUSION IN DC SPUTTERED TIN B-C-N MULTILAYERS/, Applied physics letters, 73(8), 1998, pp. 1077-1079
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
73
Issue
8
Year of publication
1998
Pages
1077 - 1079
Database
ISI
SICI code
0003-6951(1998)73:8<1077:SIIDST>2.0.ZU;2-H
Abstract
The diffusion in TiN/B-C-N multilayers during vacuum annealing at temp eratures up to 1000 degrees C and/or 300 keV argon irradiation is stud ied. Changes in composition, stress field, bilayer repeat length, and interface quality are reported. The effect of stress on diffusion is p roved by performing the same annealing or the same irradiation on a mu ltilayer with and without compressive stress. During thermal annealing , demixing or phase separation is observed. On the contrary, during ir radiation, mixing occurs. Both phenomena are enhanced in the presence of the stress field. (C) 1998 American Institute of Physics. [S0003-69 51(98)00234-4].