RARE-EARTH-DOPED ALUMINA THIN-FILMS DEPOSITED BY LIQUID SOURCE CVD PROCESSES

Two types of liquid-source CVD processes are proposed for the growth o f rare earth-doped alumina thin films suitable as amplifying media for integrated optic applications. Amorphous, transparent, pure and erbiu m- or neodymium-doped alumina films were deposited between 573 and 833 K by atmospheric pressure aerosol CVD. The rare earth doping concentr ation increases by decreasing the deposition temperature. The refracti ve index of the alumina films increases as a function of the depositio n temperature from 1.53 at 573 K to 1.61 at 813 K. Neodymium-doped fil ms were also obtained at low pressure by liquid source injection CVD. (C) 1998 Elsevier Science S.A.