SURFACE MORPHOLOGICAL MODIFICATION OF PT THIN-FILMS INDUCED BY GROWTHTEMPERATURE
Citation
Sq. Wei et al., SURFACE MORPHOLOGICAL MODIFICATION OF PT THIN-FILMS INDUCED BY GROWTHTEMPERATURE, Physical review. B, Condensed matter, 58(7), 1998, pp. 3605-3608
Categorie Soggetti
Physics, Condensed Matter
SICI code
0163-1829(1998)58:7<3605:SMMOPT>2.0.ZU;2-E
Abstract
Grazing-incidence x-ray reflectivity (GIXR), x-ray diffraction, and at
omic-force microscopy (AFM) are used to characterize surface structure
s of Pt thin films grown on ultrasmooth SiO2 substrates. The GIXR spec
tra of the Pt thin films are found to be strongly dependent on the gro
wth temperature. The surface roughness of the Pt thin films shows a mi
nimum (1.21 nm) at the optimum temperature of 773 K, which is in good
agreement with that obtained by the AFM measurements. The surface morp
hology of the Pt thin film grown at 300 K is three dimensional and has
mountainlike islands with smaller grain sizes of 10-20 nm. In contras
t, the surface of the Pt thin film grown at 773 K is composed of ridge
s, troughs, and fiat facets.