NUCLEATION AND GROWTH OF ANODIC OXIDE-FILMS ON BISMUTH

Citation
Z. Grubac et M. Metikoshukovic, NUCLEATION AND GROWTH OF ANODIC OXIDE-FILMS ON BISMUTH, Electrochimica acta, 43(21-22), 1998, pp. 3175-3181
Citations number
41
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
43
Issue
21-22
Year of publication
1998
Pages
3175 - 3181
Database
ISI
SICI code
0013-4686(1998)43:21-22<3175:NAGOAO>2.0.ZU;2-B
Abstract
Combined voltammetry and potentiostatic transient techniques have been used to study nucleation, formation and growth of thin oxide films on high purity polycrystalline bismuth in a berate buffer solution, pH = 9.2. It was shown that the initial step in the formation of the conti nuous anodic layer of bismuth oxide on bismuth is a nucleation process . The potentiostatic technique was a valuable tool in its study. The o xide him nucleation kinetics were explained reasonably well through a 3D progressive nucleation and growth mechanism under diffusion control led growth. Nucleation potential (E-AN), steady-state nucleation rate (AN(0)) and the number density of growing centre (N-s) are determined. A detailed mechanistic interpretation of the nucleation process and t hickening of the anodic layer under potentiodynamic conditions was obt ained using the criteria of cyclic voltammetry. (C) 1998 Published by Elsevier Science Ltd. All rights reserved.