A NUMERICAL STUDY OF RESOLUTION AND CONTRAST IN SOFT-X-RAY CONTACT MICROSCOPY

We consider the case of soft X-ray contact microscopy using a laser-pr oduced plasma, We model the effects of sample and resist absorption an d diffraction as well as the process of isotropic development of the p hotoresist, Our results indicate that the micrograph resolution depend s heavily on the exposure and the sample-to-resist distance, In additi on, the contrast of small features depends crucially on the developmen t procedure to the point where information on such features may be des troyed by excessive development, These issues must be kept in mind whe n interpreting contact microradiographs of high resolution, low contra st objects such as biological structures.