DRY FRICTION BEHAVIOR OF SICX(H) (1,5-LESS-THAN-X-LESS-THAN-3) COATINGS OBTAINED BY MICROWAVE PACVD

Thin coatings in the Si-C system were obtained in a plasma device acti ved by microwave. Their chemical composition and mechanical properties are dependent on the deposition parameters like temperature and gas f low rate in the reactor. When the substrate temperature increases the stationnary dry friction coefficient is lower than 0.1 and the wear sc ar is smooth. In this case surface analyses reveal an interfacial laye r on the antagonist which participates to the good tribological behavi our. With a hydrogen flow in the reactor, the coating flaked. The micr ostructure, the mechanical properties and the tribological behaviour a re closely interdependent.