Ag. Liu et al., INNER SURFACE ION-IMPLANTATION USING DEFLECTING ELECTRIC-FIELD, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 143(3), 1998, pp. 306-310
Because of its non line-of-sight nature, researchers have recently foc
used on plasma immersion ion implantation (PIII) to enhance the proper
ties of inner surfaces of industrial components to combat wear and cor
rosion. However, theoretical simulation has shown a relatively dim pro
spect because of the limitation on impact energy and retained dose. In
this paper, we describe a procedure to improve the efficiency of inne
r surface implantation by using a symmetrical experimental setup and d
eflecting electric field. Improvements of 43% and 71% are observed for
the implantation depth and retained dose, respectively. Since a large
portion of the ions implanted into the interior surface originate fro
m outside of the bore, a longer pulse-width will be more beneficial. (
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