DEPENDENCE OF FILM COMPOSITION AND THICKNESSES ON OPTICAL AND ELECTRICAL-PROPERTIES OF ITO-METAL-ITO MULTILAYERS

ITO-metal-ITO (IMI) multilayers have been prepared by DC-magnetron rea ctive sputtering in hn vertical Inline sputtering system. AgCu films w ith different film thicknesses were used as metallic layers. The trans mission and the reflection of the multilayers were measured, as well a s the film thickness and the sheet resistance. The complex indices of refraction both of ITO and of AgCu were calculated from the measured d ata. By theoretical simulations an optimization of material compositio n and of film thicknesses has been carried out. With the IMI multilaye r a sheet resistance of 5.7 Omega/sq. and a maximum transmission of ab out 83% was achieved. The performance of the multilayers as transparen t conducting materials was compared by using a figure of merit propose d by Haacke. (C) 1998 Elsevier Science S.A. All rights reserved.