T. Miyamoto et al., ACIDIC PROPERTY OF MFI-TYPE GALLOSILICATE DETERMINED BY TEMPERATURE-PROGRAMMED DESORPTION OF AMMONIA, JOURNAL OF PHYSICAL CHEMISTRY B, 102(35), 1998, pp. 6738-6745
Temperature-programmed desorption of ammonia was applied to gallosilic
ate with MFI structure using the water vapor treatment method to remov
e the unnecessary low-temperature peak and the curve-fitting method to
calculate the acid strength and its distribution based on the thermod
ynamics. The determined acid amount approximately agreed with the [Ga]
-[Na] content in the low gallium content region, showing the stoichiom
etric generation of one acid site by the substitution of one gallium a
tom, and stoichiometric neutralization of one acid site by one sodium
atom. The acid strength (adsorption heat of ammonia) due to the framew
ork gallium was ca. 130 kJ mol(-1) with the small distribution, close
to that on the ZSM-5 type aluminosilicate, and was independent of the
composition. This shows that the substitution of Al and Ga into the ze
olitic crystal generates the similar acid strength, and the acidic str
ength is mainly determined by the crystal structure. The extraframewor
k gallium on the ion-exchange site, which was readily formed with the
gallium content higher than 0.3-0.4 mol kg(-1), generated the addition
al type of acid site with the higher adsorption heat of ammonia.