EFFECT OF SURFACE-ROUGHNESS ON THE SECONDARY-ION YIELD IN ION SPUTTERING

Authors
MAKEEV MA BARABASI AL
Citation
Ma. Makeev et Al. Barabasi, EFFECT OF SURFACE-ROUGHNESS ON THE SECONDARY-ION YIELD IN ION SPUTTERING, Applied physics letters, 73(10), 1998, pp. 1445-1447
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
73
Issue
10
Year of publication
1998
Pages
1445 - 1447
Database
ISI
SICI code
0003-6951(1998)73:10<1445:EOSOTS>2.0.ZU;2-9
Abstract
There is extensive experimental evidence that, at low temperatures, su rface erosion by ion bombardment roughens the sputtered substrate, lea ding to a self-affine surface. These changes in the surface morphology also modify the secondary ion yield. Here, we calculate analytically the secondary ion yield in terms of parameters characterizing the sput tering process and the interface roughness. (C) 1998 American Institut e of Physics. [S0003-6951(98)04036-4].