The photoreactivity of sol-gel (SG)-TiO2 films was enhanced significan
tly with addition of a small amount of ammonium fluoride (AF) into the
SO-starting solution. The rate of the TiO2 photoinduced oxidation of
an overlying methylsiloxane monolayer reached a maximum near [AF]/[Ti]
molar ratio of 1.35 x 10(-2). The apparent rate constant was as much
as 8.2 times greater than of AF non-added system. X-Ray diffraction an
alyses clearly indicated that the principal factor is the improvement
in the anatase crystallinity caused by F ions.