THICKNESS-DEPENDENT ELECTRON ACCUMULATION IN INAS THIN-FILMS ON GAAS(111)A - A SCANNING-TUNNELING-SPECTROSCOPY STUDY

Citation
H. Yamaguchi et al., THICKNESS-DEPENDENT ELECTRON ACCUMULATION IN INAS THIN-FILMS ON GAAS(111)A - A SCANNING-TUNNELING-SPECTROSCOPY STUDY, Physical review. B, Condensed matter, 58(8), 1998, pp. 4219-4222
Citations number
30
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
58
Issue
8
Year of publication
1998
Pages
4219 - 4222
Database
ISI
SICI code
0163-1829(1998)58:8<4219:TEAIIT>2.0.ZU;2-S
Abstract
Scanning tunneling spectroscopy has been used to study quantum size ef fects on the electronic structure of thin InAs films grown on GaAs(111 )A substrates, an example of a heterostructure with a relatively large lattice mismatch. The band gap of the InAs films, as measured from cu rrent-voltage curves, decreases gradually with film thickness, and ele ctron accumulation occurs in layers that are thicker than 6 nm. Self-c onsistent calculations suggest the thickness-dependent accumulation is due to quantum size effects and Fermi-level pinning caused by the dis location network at the InAs/GaAs interface.