E. Boring et al., ALKENE AND ALKYNE INSERTION REACTIONS WITH TANTALUM METALLACARBORANE COMPLEXES - THE ET2C2B4H42- BORANE LIGAND AS A SPECTATOR AND PARTICIPANT, Organometallics, 17(18), 1998, pp. 3865-3874
The tantalum carborane complex (Et2C2B4H4)CpTaMe2 (1) is thermally sta
ble but undergoes clean photochemical insertion with alkynes to give v
inyltantalum species, in contrast to the thermal reactivity of isoelec
tronic group 4 metallocenes which give methylidene intermediates. Cert
ain tantalum vinyltitanium products display NMR resonances indicative
of gamma-agostic Ta-H3C interactions sufficiently strong to stabilize
two different regioisomers. Decomposition of these species occurs by a
pparent alkyne deinsertion and ejection of the tantalum fragment to gi
ve R2Et2C4B4H4 (R = Me, Et, Ph) carborane clusters. The analogous diph
enyl complex (Et2C2B4H4)CpTaPh2 (8) is thermally reactive, eliminating
benzene and undergoing trapping reactions of the derived benzyne inte
rmediate with alkynes. The structures of the resulting metallaindene c
omplexes are supported by X-ray crystallography, protonolysis, and spe
ctroscopy. Insertions occur with good regioselectivity, controlled by
steric and stereoelectronic factors that differ somewhat from those ob
served for zirconocene and titanocene analogues. Reaction of complex 8
with excess styrene results in a novel triple-insertion process in wh
ich styrene units are added to both ortho positions of an aryl ligand
and to the central boron atom of the C2B3 ring. The proposed mechanism
(supported by the use of styrene-d(8) and alkylated metallacarborane
starting materials) features two benzyne intermediates, derived from a
ctivation of both ortho-CH bonds, and one insertion into a putative Ta
-B bond. An important hypothesis is that a Ta-C fragment can undergo i
ntramolecular insertion into a carborane B-H bond, a step unknown for
cyclopentadienyl C-H bonds and one that is potentially relevant to the
use of metallacarborane complexes as catalysts for olefin polymerizat
ion and related processes.