KINETIC SIMULATION OF VAPOR-DEPOSITION AND GROWTH

We present a stochastic Monte Carlo model of vapor deposition and grow th of a crystalline, binary, A3B metallic alloy with a negative energy of mixing. Our model incorporates deposition and surface diffusion in a physically correct manner and allows us to simulate deposition rate s that are experimentally realizable. We examine the effects of deposi tion rate and temperature on the development of short-range order (SRO ) in the as-deposited film. We see SRO increase with temperature, but we see no corresponding development of anisotropic SRO (preferential o rdering of A-B pairs along the growth direction).