LOW-PRESSURE CHEMICALLY REACTIVE PLASMA DYNAMICS

Citation
Am. Kutepov et Ai. Maksimov, LOW-PRESSURE CHEMICALLY REACTIVE PLASMA DYNAMICS, Theoretical foundations of chemical engineering, 32(4), 1998, pp. 369-378
Citations number
7
Categorie Soggetti
Engineering, Chemical
ISSN journal
00405795
Volume
32
Issue
4
Year of publication
1998
Pages
369 - 378
Database
ISI
SICI code
0040-5795(1998)32:4<369:LCRPD>2.0.ZU;2-2
Abstract
Experiments were carried out to study the discharge current as it atta ins steady-state and asymptotic values. Also examined was the integral radiation intensity of a chemically reactive plasma in a discharge in air and water vapor at 50-700 Pa and the steady-state discharge curre nt 0.5-10 mA. Glass and polymer films were used as boundary surfaces. The external-parameter range was found, in which a plasma in the trans ient and asymptotic modes behaves as a nonlinear self-organizing syste m. Models were considered that take into account the effect of plasma- initiated chemical processes on physical properties of a plasma.