MOLECULAR-DYNAMICS MONTE-CARLO SIMULATIONS OF GRAIN-BOUNDARY ELECTRON-TRANSPORT IN N-SILICON

Authors
Citation
Rp. Joshi et Rf. Wood, MOLECULAR-DYNAMICS MONTE-CARLO SIMULATIONS OF GRAIN-BOUNDARY ELECTRON-TRANSPORT IN N-SILICON, Journal of applied physics, 84(6), 1998, pp. 3197-3206
Citations number
52
Categorie Soggetti
Physics, Applied
ISSN journal
00218979
Volume
84
Issue
6
Year of publication
1998
Pages
3197 - 3206
Database
ISI
SICI code
0021-8979(1998)84:6<3197:MMSOGE>2.0.ZU;2-J
Abstract
Electron transport in Si low-angle bicrystals is analyzed by a novel M onte Carlo molecular dynamics simulation scheme. The effect of discret e charges at the grain boundaries is studied and compared to results f rom one-dimensional treatments. The average grain boundary charge dens ity strongly influences transport, and a field-dependent threshold eff ect is predicted. Details of the internal charge arrangement are shown to be quite important at low fields and/or high grain boundary charge densities. Substantial increases in current conduction are predicted at lower temperatures over the thermionic emission model. Finally, ana lyses of interacting grain boundaries indicate site-correlation effect s and a strong dependence of conductivity on the separation distance. (C) 1998 American Institute of Physics.