SELF-DEVELOPING PROCESSES IN METAL FLUORIDES UNDER A FOCUSED ELECTRON-BEAM

Authors
NIKOLAICHIK VI
Citation
Vi. Nikolaichik, SELF-DEVELOPING PROCESSES IN METAL FLUORIDES UNDER A FOCUSED ELECTRON-BEAM, Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties, 68(2), 1993, pp. 227-236
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
Philosophical magazine. A. Physics of condensed matter. Defects and mechanical properties → ACNP
ISSN journal
01418610
Volume
68
Issue
2
Year of publication
1993
Pages
227 - 236
Database
ISI
SICI code
0141-8610(1993)68:2<227:SPIMFU>2.0.ZU;2-B
Abstract
The results of a study of self-developing processes in AlF3 and LiF fi lms on thin carbon supports are presented. Rates of self-development a nd simultaneous electron-energy-loss spectra were observed in the film s of 25-500 nm thickness at current densities of 10(6)-10(8) A m-2 in a scanning transmission electron microscope. Stages of the self-develo pment are singled out and the processes taking place in these stages a re discussed. Essential differences between AlF3 and LiF are pointed o ut and a tentative scheme for the self-development is proposed.