An optical method is presented for alpha spectroscopy by measuring the
optical density of etched CR-39 samples irradiated with different alp
ha particle energies. The relation between the optical density per tra
ck, alpha energy and etching conditions were studied using a simple ex
perimental setup. An empirical formula to calculate the stopping power
of alpha particles in a CR-39 detector is proposed in this study. (C)
1998 Elsevier Science Ltd. All rights reserved.