ANNEALING-INDUCED ENHANCEMENT IN THE ACTIVATION-ENERGY OF HEAVILY BORON-DOPED POLYCRYSTALLINE DIAMOND

Citation
Bb. Li et al., ANNEALING-INDUCED ENHANCEMENT IN THE ACTIVATION-ENERGY OF HEAVILY BORON-DOPED POLYCRYSTALLINE DIAMOND, DIAMOND AND RELATED MATERIALS, 7(9), 1998, pp. 1259-1262
Citations number
25
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
7
Issue
9
Year of publication
1998
Pages
1259 - 1262
Database
ISI
SICI code
0925-9635(1998)7:9<1259:AEITAO>2.0.ZU;2-0
Abstract
We show that the electrical properties of heavily boron-doped polycrys talline chemical vapor-deposited diamond films are modified by post-de position thermal annealing with slow heating and cooling rates. We fou nd that the boron effective activation energy increased after heating and cooling cycles in the temperature range of 300-673 K. The improvem ent also depends on the doping level. Samples with a resistivity of 6. 41 m Omega.cm, 3.84 m Omega.cm and 0.826 m Omega.cm showed improvement s of 6.4, 11.5 and 205%, respectively. Scanning tunneling microscopy ( STM) images show that there were no exceptional changes in film morpho logy produced by the annealing processes, only an apparent cleaning of the surface at the nanometer scale. (C) 1998 Elsevier Science S.A.