Bb. Li et al., ANNEALING-INDUCED ENHANCEMENT IN THE ACTIVATION-ENERGY OF HEAVILY BORON-DOPED POLYCRYSTALLINE DIAMOND, DIAMOND AND RELATED MATERIALS, 7(9), 1998, pp. 1259-1262
We show that the electrical properties of heavily boron-doped polycrys
talline chemical vapor-deposited diamond films are modified by post-de
position thermal annealing with slow heating and cooling rates. We fou
nd that the boron effective activation energy increased after heating
and cooling cycles in the temperature range of 300-673 K. The improvem
ent also depends on the doping level. Samples with a resistivity of 6.
41 m Omega.cm, 3.84 m Omega.cm and 0.826 m Omega.cm showed improvement
s of 6.4, 11.5 and 205%, respectively. Scanning tunneling microscopy (
STM) images show that there were no exceptional changes in film morpho
logy produced by the annealing processes, only an apparent cleaning of
the surface at the nanometer scale. (C) 1998 Elsevier Science S.A.