ANOMALOUS RESISTANCE INDUCED BY CHAOS OF ELECTRON MOTION AND ITS APPLICATION TO PLASMA PRODUCTION

Authors
YOSHIDA Z ASAKURA H KAKUNO H MORIKAWA J TAKEMURA K TAKIZAWA S UCHIDA T
Citation
Z. Yoshida et al., ANOMALOUS RESISTANCE INDUCED BY CHAOS OF ELECTRON MOTION AND ITS APPLICATION TO PLASMA PRODUCTION, Physical review letters, 81(12), 1998, pp. 2458-2461
Citations number
16
Categorie Soggetti
Physics
Journal title
Physical review letters → ACNP
ISSN journal
00319007
Volume
81
Issue
12
Year of publication
1998
Pages
2458 - 2461
Database
ISI
SICI code
0031-9007(1998)81:12<2458:ARIBCO>2.0.ZU;2-4
Abstract
Null points in magnetic fields destroy the adiabatic invariants of cha rged particle motion, resulting in a chaotic motion. The mixing effect of the chaos produces efficient collisionless heating of electrons. T he entropy production is represented by an effective resistance in a m acroscopic description. This ''chaos-induced resistance'' enables plas ma production at a low gas pressure suitable for ultrafine plasma etch ing. [S0031-9007(98)07155-5].