DEPOSITION ON DISORDERED SUBSTRATES WITH PRECURSOR LAYER DIFFUSION

Citation
Jan. Filipe et al., DEPOSITION ON DISORDERED SUBSTRATES WITH PRECURSOR LAYER DIFFUSION, Journal of physics. A, mathematical and general, 31(37), 1998, pp. 7417-7427
Citations number
25
Categorie Soggetti
Physics,"Physycs, Mathematical
ISSN journal
03054470
Volume
31
Issue
37
Year of publication
1998
Pages
7417 - 7427
Database
ISI
SICI code
0305-4470(1998)31:37<7417:DODSWP>2.0.ZU;2-R
Abstract
Recently we introduced a one-dimensional accelerated random sequential adsorption process as a model for chemisorption with precursor layer diffusion; In this paper we consider this deposition process on disord ered or impure substrates. The problem is solved exactly on both the l attice and continuum and for various impurity distributions; The resul ts are compared with those from the standard random sequential adsorpt ion model.