Jan. Filipe et al., DEPOSITION ON DISORDERED SUBSTRATES WITH PRECURSOR LAYER DIFFUSION, Journal of physics. A, mathematical and general, 31(37), 1998, pp. 7417-7427
Recently we introduced a one-dimensional accelerated random sequential
adsorption process as a model for chemisorption with precursor layer
diffusion; In this paper we consider this deposition process on disord
ered or impure substrates. The problem is solved exactly on both the l
attice and continuum and for various impurity distributions; The resul
ts are compared with those from the standard random sequential adsorpt
ion model.