PLASMA SENSOR MEASUREMENT IN PULSED PACVD-PLASMAS

Citation
H. Klumperwestkamp et al., PLASMA SENSOR MEASUREMENT IN PULSED PACVD-PLASMAS, Materialwissenschaft und Werkstofftechnik, 29(9), 1998, pp. 459-465
Citations number
17
Categorie Soggetti
Material Science
ISSN journal
09335137
Volume
29
Issue
9
Year of publication
1998
Pages
459 - 465
Database
ISI
SICI code
0933-5137(1998)29:9<459:PSMIPP>2.0.ZU;2-3
Abstract
In order to measure local plasma parameters as electron and ion densit y, electron and ion temperature or plasma potential of inert plasmas L angmuir sensors are used. In practical applications langmuir sensors s howed significant sensor signs when the sensor surface was modified by coatings or pollution [5-16]. This effect will be utilized to measure important coating plasma parameters. Putting the langmuir electrode t o the same coating conditions as the charge will offer information of the progress of the PACVD process. The use of the sensor should especi ally show events or conditions which conduct to local or generally bad technological coating properties. So in the early stages of coating d evelopment the quality can be recognized and possibly corrected or avo ided by variation of the process parameters. Sensor controled processi ng of PACVD-technic will lead to better coating quality and will incre ase the reproduceability.