Using the first-principles pseudopotential-local-density-approximation
approach. we have studied the dissociative molecular adsorption of NH
3 on Si(001)-(2 x 1). We find that upon adsorption the Si dimer become
s symmetric and somewhat elongated. We also find that the Si-N bond is
inclined at 10 degrees with respect to the surface normal, the N-Si b
ond length is 1.75 Angstrom, and the N-H bond length is 1.05 Angstrom.
Finally, our electronic structure calculations suggest that the adsor
ption of ammonia almost completely passivates the silicon surface. [S0
163-1829(98)05636-7].