ENERGY-FLOW IN LIGHT-COUPLING MASKS FOR LENSLESS OPTICAL LITHOGRAPHY

Authors
MARTIN OJF PILLER NB SCHMID H BIEBUYCK H MICHEL B
Citation
Ojf. Martin et al., ENERGY-FLOW IN LIGHT-COUPLING MASKS FOR LENSLESS OPTICAL LITHOGRAPHY, OPTICS EXPRESS, 3(7), 1998, pp. 280-285
Citations number
6
Categorie Soggetti
Optics
Journal title
OPTICS EXPRESS → ACNP
ISSN journal
10944087
Volume
3
Issue
7
Year of publication
1998
Pages
280 - 285
Database
ISI
SICI code
1094-4087(1998)3:7<280:EILMFL>2.0.ZU;2-H
Abstract
We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the diff erent elements comprising such masks contribute to the definition of a n optical path that allows the exposure of features in the 100-nm-size range in the photoresist. (C) 1998 Optical Society of America