A. Klust et al., GROWTH OF CAF2 ON SI(111) - IMAGING OF THE CAF INTERFACE BY FRICTION FORCE MICROSCOPY, Applied physics letters, 73(14), 1998, pp. 1967-1969
The initial growth state of CaF2/Si(111) has been investigated in the
high-temperature regime (700 degrees C). At these growth temperatures
the interface between CaF2 and Si consists of CaF with the Ca atoms bo
und to the Si. Using friction force microscopy it is possible to disti
nguish between the interfacial CaF layer and the overgrowing CaF2 with
high lateral resolution: the CaF layer has a higher friction coeffici
ent than the bulklike CaF2. This material contrast has been used to in
vestigate the CaF2 nucleation on the interfacial CaF layer. (C) 1998 A
merican Institute of Physics. [S0003-6951(98)04440-4].