BLUE AND RED PHOTOLUMINESCENCE FROM GE-FILMS AND ITS MULTIPLE MECHANISM( IMPLANTED SIO2)

Citation
Jy. Zhang et al., BLUE AND RED PHOTOLUMINESCENCE FROM GE-FILMS AND ITS MULTIPLE MECHANISM( IMPLANTED SIO2), Applied physics letters, 73(13), 1998, pp. 1790-1792
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
73
Issue
13
Year of publication
1998
Pages
1790 - 1792
Database
ISI
SICI code
0003-6951(1998)73:13<1790:BARPFG>2.0.ZU;2-6
Abstract
Under violet excitation, a strong blue band and a broad red band are e mitted simultaneously from the Ge nanocrystal embedded SiO2 films fabr icated by Ge+ implantation and annealing. The blue band exhibits a com plex annealing behavior, and the photoluminescence excitation spectral analysis indicates that it results from a combination of several impl antation-induced deficient centers. The peak position of the red band shifts from 600 to 640 nm when the mean size of Ge nanocrystals increa ses from 4.3 to 6.7 nm, suggesting that the red band comes from the ra diative recombination of excitons confined in Ge nanocrystals. (C) 199 8 American Institute of Physics. [S0003-6951(98)02739-9].