Jy. Zhang et al., BLUE AND RED PHOTOLUMINESCENCE FROM GE-FILMS AND ITS MULTIPLE MECHANISM( IMPLANTED SIO2), Applied physics letters, 73(13), 1998, pp. 1790-1792
Under violet excitation, a strong blue band and a broad red band are e
mitted simultaneously from the Ge nanocrystal embedded SiO2 films fabr
icated by Ge+ implantation and annealing. The blue band exhibits a com
plex annealing behavior, and the photoluminescence excitation spectral
analysis indicates that it results from a combination of several impl
antation-induced deficient centers. The peak position of the red band
shifts from 600 to 640 nm when the mean size of Ge nanocrystals increa
ses from 4.3 to 6.7 nm, suggesting that the red band comes from the ra
diative recombination of excitons confined in Ge nanocrystals. (C) 199
8 American Institute of Physics. [S0003-6951(98)02739-9].