ATOMIC STRUCTURES OF HYDROGEN-TERMINATED SI(001) SURFACES AFTER WET CLEANING BY SCANNING-TUNNELING-MICROSCOPY
Citation
K. Endo et al., ATOMIC STRUCTURES OF HYDROGEN-TERMINATED SI(001) SURFACES AFTER WET CLEANING BY SCANNING-TUNNELING-MICROSCOPY, Applied physics letters, 73(13), 1998, pp. 1853-1855
Categorie Soggetti
Physics, Applied
SICI code
0003-6951(1998)73:13<1853:ASOHSS>2.0.ZU;2-D
Abstract
Scanning tunneling microscopy observations are performed on a H-termin
ated Si(001) surface treated with HF solutions and ultrapure water wit
h very low dissolved oxygen and total organic carbon contents. Over a
large area, row structures are observed in [110] and [1 (1) over bar 0
] directions. Pyramidal-shaped etch pits are also observed, which are
caused by anisotropic etching by OH ions. Detailed images clearly show
2 X 1 periodic structures. It is suggested that every other row of th
e ideally dihydride 1 X 1 surface is etched preferentially by OH ions.
This explains the mechanism by which the smallest etch pits are forme
d. (C) 1998 American Institute of Physics. [S0003-6951(98)01839-7].