Pb. Shah et Ka. Jones, 2-DIMENSIONAL NUMERICAL INVESTIGATION OF THE IMPACT OF MATERIAL-PARAMETER UNCERTAINTY ON THE STEADY-STATE PERFORMANCE OF PASSIVATED 4H-SIC THYRISTORS, Journal of applied physics, 84(8), 1998, pp. 4625-4630
We calculated the impact of inaccurate values of the free-carrier life
time, SiC/SiO2 interface recombination velocity and interface charge,
dopant ionization energy, electric permittivity, impact ionization rat
es, saturation velocity and field-dependent mobility on the holding cu
rrent, switching current, and breakover voltage at different applied g
ate currents for an interdigitated 4H-SiC thyristor with two-dimension
al steady-state numerical simulations. We observed that free-carrier l
ifetimes, interface charge and recombination velocity, and impurity io
nization energy have the greatest impact on thyristor performance. As
the carrier lifetime increases, the holding current decreases and the
results logarithmically approach a single I-V curve in the negative di
fferential resistance region. Comparing interface charge and recombina
tion velocity, we demonstrated that recombination velocity has a large
r effect on the holding current, but interface charge has a larger eff
ect on the breakover voltage. Also, deeper acceptors increase the hold
ing current, while deeper donors decrease the holding current. Our res
ults demonstrate that mapping the negative differential resistance reg
ion by plotting the breakover voltage for different applied gate curre
nts can give valuable information on the device and material propertie
s. The experimentally observed nonuniform changes in the breakover vol
tage and switching current for uniform gate current steps are explaine
d. The results indicate that interface properties must be included whe
n simulating turn-on and turn-off by gate control. The results also in
dicate that the free-carrier lifetime variations that occur across a w
afer can lead to large differences in the performance of two devices t
hat are expected to have undergone identical processing. (C) 1998 Amer
ican Institute of Physics. [S0021-8979(98)03220-4]