COMBINATORIAL APPROACHES TOWARD PATTERNING NANOCRYSTALS

Citation
T. Vossmeyer et al., COMBINATORIAL APPROACHES TOWARD PATTERNING NANOCRYSTALS, Journal of applied physics, 84(7), 1998, pp. 3664-3670
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
84
Issue
7
Year of publication
1998
Pages
3664 - 3670
Database
ISI
SICI code
0021-8979(1998)84:7<3664:CATPN>2.0.ZU;2-3
Abstract
A scheme for generating complex, spatially separated patterns of multi ple types of semiconducting and/or metallic nanocrystals is presented. The process is based on lithographic patterning of organic monolayers that contain a photolabile protection group and are covalently bound to SiO2 surfaces. The process results in spatially and chemically dist inct interaction sites on a single substrate. Nanocrystal assembly occ urs with a high selectivity on just one type of site. We report on the production of binary, tertiary, and quaternary patterns of nanocrysta ls. We highlight and discuss the differences between nanocrystal/subst rate assembly and molecule/substrate assembly. Finally, we investigate the assembled structures using photoluminescence and absorption spect roscopy. (C) 1998 American Institute of Physics. [S0021-8979(98)06719- X]