A scheme for generating complex, spatially separated patterns of multi
ple types of semiconducting and/or metallic nanocrystals is presented.
The process is based on lithographic patterning of organic monolayers
that contain a photolabile protection group and are covalently bound
to SiO2 surfaces. The process results in spatially and chemically dist
inct interaction sites on a single substrate. Nanocrystal assembly occ
urs with a high selectivity on just one type of site. We report on the
production of binary, tertiary, and quaternary patterns of nanocrysta
ls. We highlight and discuss the differences between nanocrystal/subst
rate assembly and molecule/substrate assembly. Finally, we investigate
the assembled structures using photoluminescence and absorption spect
roscopy. (C) 1998 American Institute of Physics. [S0021-8979(98)06719-
X]