Kh. Yoon et al., EFFECT OF PT LAYERS ON THE PHOTOELECTROCHEMICAL PROPERTIES OF A WO3 P-SI ELECTRODE/, Journal of applied physics, 84(7), 1998, pp. 3954-3959
The effect of Pt deposition on the photoelectrochemical properties of
a WO3/p-Si electrode was studied with regard to hydrogen evolution, ph
otocurrent transient, and chemical stability. Deposition of Pt layers
made it possible for photocurrent onset potential to be shifted to a m
ore positive value and both the photocurrent density and hydrogen evol
ution rate were increased. These phenomena can be explained by the fac
t that Pt loading decreases the overpotentials in the reduction reacti
on at the electrode/electrolyte interfaces to make electron transfer f
aster, as well as decrease the recombination rate of carriers. The inf
luences of the Pt layer were confirmed by investigating the photocurre
nt transient behaviors. In the case of the Pt/WO3/p-Si electrode, part
icularly high quantum efficiencies were obtained in a wavelength range
of 430-700 nm, possibly due to inelastic electron-electron scattering
. The Pt/WO3/p-Si electrodes did not show any detectable corrosion aft
er illumination for 5 h according to the observation of surface micros
tructures. (C) 1998 American Institute of Physics. [S0021-8979(98)0781
9-0].