FLUENCE DEPENDENCE OF MEAN SPUTTER DEPTH FOR BOMBARDED PT-CU AND B-10-B-11 BINARY MATERIALS

The mean sputter depth depends on the surface composition gradient dur ing ion implantation. For the high fluence ion implantation into a Pt- Cu alloy, the surface composition gradient of Cu is so large that the difference in mean sputter depth between Pt and Cu, is significant. Ho wever, for the high fluence ion implantation into B-10-B-11 isotope mi xture, the surface composition gradient of B-10 is so small that the d ifference in mean sputter depth between B-10 and B-11 is insignificant .