Yq. Fu et al., MECHANICAL AND TRIBOLOGICAL PROPERTIES OF ION-BEAM-ENHANCED-DEPOSITION TIN THIN-FILMS, Journal of materials processing technology, 83(1-3), 1998, pp. 209-216
Citations number
26
Categorie Soggetti
Material Science","Engineering, Manufacturing","Engineering, Industrial
Hard titanium nitride thin films were deposited using the ion-beam-enh
anced deposition (IBED) technique. The deposition process involves spu
ttering the titanium target whilst using an N+ ion beam to bombard the
film. The deposition parameters were changed by varying the ion bomba
rdment energies and bombardment procedures. The microstructure and mic
rohardness of the thin films were studied. The tribological behavior o
f the films was evaluated using the block-on-ring sliding wear test. T
he bonding strengths of the films were evaluated by a new method modif
ied from the rolling-contact fatigue test. Scanning electron microscop
y (SEM) and transmission electron microscopy (TEM) analysis showed tha
t the grain size increased with increasing bombardment energy. X-ray d
iffraction (XRD) results indicated that when the bombardment energy in
creased from 10 to 40 keV, the preferred orientation was changed from
(111) to (200). The results showed that both the hardness and the wear
resistance of the film decreased with an increase in bombardment ener
gy. The effect of ion bombardment procedures on the bonding strength o
f the thin films is discussed. (C) 1998 Elsevier Science S.A. All righ
ts reserved.