ATOMIC-FORCE MICROSCOPIC STUDIES ON THE GROWTH OF SELF-ASSEMBLED MONOLAYERS ON SRTIO3-SURFACES

Citation
Bl. Kropman et al., ATOMIC-FORCE MICROSCOPIC STUDIES ON THE GROWTH OF SELF-ASSEMBLED MONOLAYERS ON SRTIO3-SURFACES, Thin solid films, 329, 1998, pp. 185-190
Citations number
27
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
329
Year of publication
1998
Pages
185 - 190
Database
ISI
SICI code
0040-6090(1998)329:<185:AMSOTG>2.0.ZU;2-2
Abstract
The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 subst rates has been investigated by wettability and force microscopy measur ements. The films were formed by the self-assembly technique. It was f ound that growth proceeded via two types of islands: large 'fractal-li ke' islands and smaller circular patches of molecules. The patches gro w by attachment of monomers and coalescence with other islands. The ov erall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica The diffe rence between growth on SrTiO3 and SrTiO3:Nb is that the growth rate i s slower on the latter substrate. (C) 1998 Elsevier Science S.A. All r ights reserved.