RECOMBINATION CENTERS CREATED BY AR-ION IMPLANTATION INTO SIMOX SUBSTRATES (VOL 145, PG 1795, 1998)()

Authors
TAKAHASHI M SAKAKIBARA Y OHNO T
Citation
M. Takahashi et al., RECOMBINATION CENTERS CREATED BY AR-ION IMPLANTATION INTO SIMOX SUBSTRATES (VOL 145, PG 1795, 1998)(), Journal of the Electrochemical Society, 145(10), 1998, pp. 3697-3697
Citations number
1
Categorie Soggetti
Electrochemistry,"Materials Science, Coatings & Films
Journal title
Journal of the Electrochemical Society → ACNP
ISSN journal
00134651
Volume
145
Issue
10
Year of publication
1998
Pages
3697 - 3697
Database
ISI
SICI code
0013-4651(1998)145:10<3697:RCCBAI>2.0.ZU;2-1