U. Messerschmidt et al., HIGH-TEMPERATURE IN-SITU STRAINING EXPERIMENTS IN THE HIGH-VOLTAGE ELECTRON-MICROSCOPE, MICROSCOPY AND MICROANALYSIS, 4(3), 1998, pp. 226-234
Design rules are described here for high-temperature straining stages
for transmission electron microscopy. Temperatures above 1000 degrees
C can be attained by electron bombardment of the specimen grips. Therm
al equilibrium can be reached in a short time by carrying off the heat
by water cooling. Some applications of this stage are described. Ferr
oelastic deformation was observed at 1150 degrees C in t' and partiall
y stabilized zirconia, which changes the microstructure for successive
dislocation plasticity. In the oxide-dispersion-strengthened alloy IN
COLOY MA 956, dislocations are impeded by oxide particles and move smo
othly between the particles. At high temperatures, both the resting an
d traveling times control the average dislocation velocity. In MoSi2 s
ingle crystals of a soft orientation, dislocations with 1/2[111] Burge
rs vectors are created in localized sources and move on {110} planes i
n a viscous manner. The dislocations in Al-Pd-Mn single quasicrystals
are oriented in preferred crystallographic directions and move in a vi
scous way as well. On the basis of in situ observations, conclusions a
re drawn for interpreting macroscopic deformation behavior at high tem
peratures.