R. Hull et al., APPLICATIONS OF ION MICROSCOPY AND IN-SITU ELECTRON-MICROSCOPY TO THESTUDY OF ELECTRONIC MATERIALS AND DEVICES, MICROSCOPY AND MICROANALYSIS, 4(3), 1998, pp. 308-316
We discuss the application of ion microscopy and in situ electron micr
oscopy to the study of electronic and optical materials and devices. W
e demonstrate how the combination of in situ transmission electron mic
roscopy and focused ion beam microscopy provides new avenues for the s
tudy for such structures, enabling extension of these techniques to th
e study of dopant distributions, nanoscale stresses, three-dimensional
structural and chemical reconstruction and real-time evolution of def
ect microstructure. We also discuss in situ applications of thermal, m
echanical, electrical, and optical stresses during transmission electr
on microscopy imaging.