A POSITIVE-WORKING ALKALINE DEVELOPABLE PHOTORESIST BASED ON T-BOC-CALIX[4]RESORCINARENE AND A PHOTOACID GENERATOR

A positive working photoresist based on octa-O-tert-butyl carbonated C -hexylcalix[4]resorcinarene (t-BOC-h-C4) and p-nitrobenzyl-9, 10-dimet hoxy-anthracene-2-sulfonate (NDS) as a photoacid generator has been de veloped. The photoresist consisting of t-BOC-h-C4 (90 wt%) and NDS (10 wt%) showed a sensitivity of 24 mJ/cm(2) and a contrast of 8.1, when it was exposed to 365 nm light and postbaked at 90 degrees C for 2 min . followed by developing with a 1% aqueous tetramethylammonium hydroxi de (TMAH) solution at room temperature.