MECHANISMS AND KINETICS OF THE INITIAL-STAGES OF GROWTH OF FILMS GROWN BY CHEMICAL-VAPOR-DEPOSITION

The initial stages of growth of films and coatings by chemical vapor d eposition are investigated. A system of equations is derived which des cribes the evolution of an island him at the stage of Ostwald ripening under conditions characteristic of vapor deposition. Solving this sys tem of equations yields the dependence of all of the main characterist ics of island films (the size distribution function of the islands, th e dependence of the mean radius and density of the islands) as functio ns of rime and the spatial coordinate, Suggestions are given for the p reparation of films with prescribed properties. (C) 1998 American Inst itute of Physics. [S1063-7842(98)01807-8].