MODELING THE DEPOSITION OF MATERIALS ON CAPILLARY WALLS FROM VAPOR-GAS MIXTURES UNDER PULSED HEATING

Authors
ZOTOV VV PROKOPEV EP
Citation
Vv. Zotov et Ep. Prokopev, MODELING THE DEPOSITION OF MATERIALS ON CAPILLARY WALLS FROM VAPOR-GAS MIXTURES UNDER PULSED HEATING, Technical physics, 43(8), 1998, pp. 1007-1008
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
Technical physics → ACNP
ISSN journal
10637842
Volume
43
Issue
8
Year of publication
1998
Pages
1007 - 1008
Database
ISI
SICI code
1063-7842(1998)43:8<1007:MTDOMO>2.0.ZU;2-N
Abstract
The deposition of silicon in capillaries during the thermochemical rea ction of silicon tetrachloride with hydrogen under pulsed heating is c onsidered theoretically. It is shown that such a reaction results in a significant increase in the uniformity of the deposition rate along t he length of a capillary. (C) 1998 American institute of Physics. [S10 63-7842(98)02608-7].