We have investigated the spectroscopy and reaction of HCN (DCN) adsorb
ed on Si(100)-2x1 at T(s) greater-than-or-equal-to 100 K using HREELS,
XPS, and UPS. HCN (DCN) formed dimers and/or polymers on the surface
at 100 K and higher dosages (D > 4 langmuirs). The HREEL spectrum obta
ined after warming a 4.5-langmuir HCN dosed surface to 220 K resembles
that obtained with a lower HCN dosage (D < 0.6 langmuir). Two major s
pecies, HCNH and CN, could be identified from this spectrum. The forme
r species showed peaks at 160, 368, and approximately 400 meV for HC=N
H, CH, and NH stretching vibrations, respectively, while the latter sh
owed a peak at 263 meV due to the C=N stretching vibration. In the cor
responding DCN experiment, the DC=ND stretching mode was observed at 1
24 meV. Annealing the sample at 560 K appeared to cause the reorientat
ion of the CN radical from an end-on to a side-on adsorption geometry
as evidenced by HREELS, UPS, and XPS analyses. At 600-800 K, the break
ing of NH and CN bonds occurred on the surface. Above 1000 K, a mixtur
e of silicon carbide and silicon nitride was formed after the complete
dissociation of CH, NH, and CN bonds and the desorption of H species.