STUDY ON ZR-SI W(100) SURFACE AT HIGH-TEMPERATURES BY COMBINED SURFACE-ANALYSIS TECHNIQUES/

Citation
T. Kawano et al., STUDY ON ZR-SI W(100) SURFACE AT HIGH-TEMPERATURES BY COMBINED SURFACE-ANALYSIS TECHNIQUES/, JPN J A P 1, 37(8), 1998, pp. 4561-4562
Citations number
10
Categorie Soggetti
Physics, Applied
Volume
37
Issue
8
Year of publication
1998
Pages
4561 - 4562
Database
ISI
SICI code
Abstract
The basic mechanism of electron emissivity of a Zr-Si/W(100) surface, which has attracted much attention as a thermal field emitter for prac tical use, was studied by Auger electron spectroscopy, ion scattering spectroscopy and work function measurements. The results show that the topmost atomic layer consists of Zr and Si at operating conditions (s imilar to 1300 K, 10(-9) Torr), the work function of which is slightly reduced by an order of half an eV from that of a clean W(100) surface .