TRANSLATIONAL TEMPERATURE-MEASUREMENT FOR SIH2 IN RF SILANE PLASMA USING CW LASER-INDUCED FLUORESCENCE SPECTROSCOPY

Authors
KONO A HIROSE S KINOSHITA K GOTO T
Citation
A. Kono et al., TRANSLATIONAL TEMPERATURE-MEASUREMENT FOR SIH2 IN RF SILANE PLASMA USING CW LASER-INDUCED FLUORESCENCE SPECTROSCOPY, JPN J A P 1, 37(8), 1998, pp. 4588-4589
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS → ACNP
Volume
37
Issue
8
Year of publication
1998
Pages
4588 - 4589
Database
ISI
SICI code
Abstract
Laser-induced fluorescence spectroscopy using a cw ring dye laser was applied to the detection of low-density SiH2 in a low-power RF SiH4/Ar mixture plasma at 40 mTorr. The translational temperature of SiH2 in the plasma was determined from the excitation line profile and was fou nd to be near room temperature irrespective of the SiH4 mixing ratio.