Kh. Kim et al., FE3SI PHASE-FORMATION AT FE SI(111)-7X7 INTERFACE AT ROOM-TEMPERATURESTUDIED BY SEMIEMPIRICAL THEORY/, JPN J A P 1, 37(9A), 1998, pp. 4949-4953
The reaction at the Fe/Si interface and the growth mode of Fe on Si(11
1)-7 x 7 substrate at room temperature were investigated. The Si-2p co
re level photoemission spectra as a function of deposited Fe thickness
were measured, and were analyzed by the modified Butera's model based
on the semiempirical theory. Islands of Fe3Si phase were formed in th
e unreacted Fe matrix on Fe thickness of about 1 Angstrom to 10 Angstr
om and silicide growth was restricted to the Fe thickness. Bulk Fe was
grown by further Fe-deposition.