H. Sano et al., THE EFFECT OF ACCELERATION VOLTAGES ON THE PREPARATION OF CUINSE2 THIN-FILMS BY IONIZED CLUSTER BEAM TECHNIQUE, JPN J A P 2, 37(9AB), 1998, pp. 1070-1073
Polycrystalline CuInSe2 thin films were prepared on Mo-coated soda-lim
e glass substrates by the ionized cluster beam (ICB) technique, in whi
ch Cu, In and Se vapors were ionized and accelerated. The dependence o
f the film properties on acceleration voltage were studied. The substr
ate temperature was maintained below 350 degrees C. The films were cha
racterized using X-ray diffraction (XRD), scanning electron microscope
(SEM), an electron-probe microanalyzer (EPMA) and the Rutherford back
scattering spectrometry (RBS). It was found that polycrystalline films
with improved grain size and uniformity were obtained when the accele
ration voltage exceeded 4 kV, and the acceleration voltage played an i
mportant rule in the formation of the ternary compound during the crys
tal growth.