THE EFFECT OF ACCELERATION VOLTAGES ON THE PREPARATION OF CUINSE2 THIN-FILMS BY IONIZED CLUSTER BEAM TECHNIQUE

Citation
H. Sano et al., THE EFFECT OF ACCELERATION VOLTAGES ON THE PREPARATION OF CUINSE2 THIN-FILMS BY IONIZED CLUSTER BEAM TECHNIQUE, JPN J A P 2, 37(9AB), 1998, pp. 1070-1073
Citations number
13
Categorie Soggetti
Physics, Applied
Volume
37
Issue
9AB
Year of publication
1998
Pages
1070 - 1073
Database
ISI
SICI code
Abstract
Polycrystalline CuInSe2 thin films were prepared on Mo-coated soda-lim e glass substrates by the ionized cluster beam (ICB) technique, in whi ch Cu, In and Se vapors were ionized and accelerated. The dependence o f the film properties on acceleration voltage were studied. The substr ate temperature was maintained below 350 degrees C. The films were cha racterized using X-ray diffraction (XRD), scanning electron microscope (SEM), an electron-probe microanalyzer (EPMA) and the Rutherford back scattering spectrometry (RBS). It was found that polycrystalline films with improved grain size and uniformity were obtained when the accele ration voltage exceeded 4 kV, and the acceleration voltage played an i mportant rule in the formation of the ternary compound during the crys tal growth.