Dendrimer-based self-assembled monolayers as resists for scanning probe lithography

Authors
Tully, DC Wilder, K Frechet, JMJ Trimble, AR Quate, CF
Citation
Dc. Tully et al., Dendrimer-based self-assembled monolayers as resists for scanning probe lithography, ADVAN MATER, 11(4), 1999, pp. 314-318
Citations number
23
Categorie Soggetti
Multidisciplinary,"Material Science & Engineering
Journal title
ADVANCED MATERIALS
ISSN journal
09359648 → ACNP
Volume
11
Issue
4
Year of publication
1999
Pages
314 - 318
Database
ISI
SICI code
0935-9648(19990304)11:4<314:DSMARF>2.0.ZU;2-D